PERSONAL FACTS

Name:                     Maria Isabel Alonso Carmona
Date of birth:          May 11th, 1961
Born:                       Barcelona (Spain)
Business address:           Institut de Ciència de Materials de Barcelona, CSIC
Campus de la UAB, E-08193 Bellaterra, Spain.
Tel.: +34 935 801 853
Fax: +34 935 805 729
e-mail: isabel@icmab.es

ACADEMIC FORMATION

October 1979 – June 1984. Bachelor in Physics at the Universitat Autònoma de Barcelona, Spain.
September 1984 – April 1985. Master Thesis in Physics by the Universitat Autònoma de Barcelona, Spain.
May 1985 – October 1989. Ph. D. research fellowship at the Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany. Dr. rer. nat. (Ph. D.) Thesis at the University of Stuttgart, Germany.

EXPERIENCE
November 1989 – January 1990. postdoctoral research associate at Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany
February 1990 – July 1992. research contract at Centro Nacional de Microelectrónica, CSIC, Madrid, Spain.
October 1992 – April 1996. research contract at the Institut de Ciència de Materials, CSIC, Barcelona, Spain.
between 1992-1994. several research stays at the Paul-Drude Institut für Festkörperelektronik, Berlin, Germany.
since May 1996. staff researcher at the Institut de Ciència de Materials, CSIC, Barcelona.
since October 2006.  head of department “Optoelectronic and Surface Properties of Nanostructured Materials”.

Author of about 90 articles with about 1300 citations in the fields of epitaxial growth and optical characterization of bulk semiconductors, semiconductor heterostructures, both inorganic and organic, and high critical temperature superconductors; spectroscopic ellipsometry of multilayered and anisotropic materials.